Used ULVAC Ceraus ZX-1000 #9270490 for sale

ULVAC Ceraus ZX-1000 is an advanced, precision sputtering equipment used for a variety of applications, including thin film deposition and patterning, nanostructure fabrication, and sputter cleaning. The system consists of a vacuum chamber, an RF/DC power source, a RF/DC sputter gun, and a gas box. The vacuum chamber of ULVAC CERAUS ZX 1000 is designed to achieve ultra-high vacuum levels. It is constructed with a stainless steel frame and two viewports, enabling viewing while the sputtering process is taking place. The chamber has a built-in turbo pumping unit and a pressure gauge, allowing easy monitoring of the chamber pressure while in the process of sputtering. Inside the chamber, there are two shelves designed to accommodate the substrates to be sputtered. The shelves can hold up to four 4'' wafers at a time. The RF/DC power source provides precise control over the sputtering process. It enables independent control of the RF and DC voltage, pulse frequency, and pulse width, allowing for fine-tuned adjustments and optimized process conditions. The RF/DC power source can control up to four targets simultaneously. The RF/DC sputter gun is designed for deposition on both flat and curved surfaces. It is equipped with an ion source for ion etching, which enables precise control over material removal. The sputter gun's unique design enables deep sputter etching and efficient coating of large areas. Finally, the gas box provides precise control over the flow of inert gases, enabling the user to create an ideal atmosphere for the sputtering process. The gas box also features a safety switch, allowing the user to quickly shut off the gas in case of an emergency. In summary, Ceraus ZX-1000 is an advanced sputtering machine designed for precise thin film deposition, patterning, nanostructure fabrication, and sputter cleaning. It consists of a vacuum chamber,RF/DC power source, RF/DC sputter gun, and a gas box, all of which enable precise control over the sputtering process.