Used ULVAC Ceraus ZX-1000 #9409842 for sale

ULVAC Ceraus ZX-1000 is an advanced sputtering equipment designed to deposit thin film materials onto substrates in a highly precise fashion. It utilizes a variety of source materials, including metals, alloys, metals, polymers, insulators, and other specialty materials, to create a range of diverse thin film structures. The system is capable of delivering up to four-meter-square deposition area coverage with three different deposition processes, namely DC or magnetron sputtering, ion beam sputtering (IBS), and electron beam evaporation (EB). The unit features a robust chamber design, with a 4-stage rotary turbomolecular pumping machine that keeps the pressure within the chamber below one-millionth of an atmosphere. It has a multi-position tilting turret for easy substrate exchange, and an external sample baking option for maintaining an optimal chamber environment during process runs. Additionally, the chamber has an internal gas injection tool for controlling the atmosphere and an auto-gas control unit for automatic flow rate adjustments. The asset includes a Tofutron RF/DC power supply with advanced hybrid pulse power supply technology and high frequency generator option, enabling a high deposition rate and improved process stability. The power supply can be coupled with other plasma process components, including an HF/DC bi-polar power source and advanced magnetron sources with high-frequency power supply configurations. This combination of multiple parameters within the model allows for precise control of material deposition rates, uniformity, adhesion, and crystalline perfection levels. ULVAC CERAUS ZX 1000 provides a large variety of features for high-precision sputtering applications. It has an advanced monitoring equipment for close process control, including oxygen and inert gauges, a pressure gauge display, and SEM photos. It also allows for remote monitoring and control of the system via a touchscreen interface. Furthermore, the unit offers advanced safety features, such as a gas detection machine, cleaning tool, and an emergency shut-off function. In conclusion, Ceraus ZX-1000 is an advanced, reliable asset engineered for precision sputtering applications. It offers various state-of-the-art features such as a robust chamber design, multiple deposition process configurations, advanced RF/DC power supplies, and integrated safety systems. These features ensure high-quality thin-film processes, making the model an ideal choice for research and production sputtering applications.