Used ULVAC Ceraus #154325 for sale

ULVAC Ceraus is a sputtering equipment designed for thin film deposition and device fabrication. The system consists of four main components: a vacuum chamber, an ultra-high vacuum (UHV) pump, a remote sputter source, and a power source. The vacuum chamber is the main component of a Ceraus unit and is the large, airtight metal box where the substrate is placed during the deposition process. It consists of a cylindrical tube with a removable lid and includes isolation valves, a pressure gauge and a viewport. The isolation valves provide access to other components in the machine, while the pressure gauge and viewport are used to monitor the vacuum level and process conditions in the chamber. The ultra-high vacuum (UHV) pump is used to reduce the pressure inside the chamber and evacuate any residual gases. The UHV pump works by creating a vacuum which is then maintained by a combination of primary, secondary and tertiary pumps. The remote sputter source is a plasma device with an anode and a cathode connected to a voltage source. It consists of a magnetic tool that allows for control of the plasma. The remote sputter source is used to deposit thin films onto the substrate in a controlled manner. The power source is used to provide the voltage needed for the sputter process. It can take the form of DC, RF or pulsed DC. ULVAC Ceraus sputtering systems are capable of depositing thin films of a variety of materials including metals, alloys, semiconductor compounds and dielectric layers. The asset is used in applications such as photonic devices, flat panel display components, solar cells and thin film coatings. The control model allows for precise control of the deposition process, making it suitable for high-end fabrication.