Used ULVAC Ceraus #9137188 for sale

ULVAC Ceraus is a high-performance sputtering equipment designed for advanced control of thin film deposition. It is engineered to provide excellent uniformity for large area substrates as well as for high throughput. The system features an all in one vacuum chamber design, which is a single chamber equipped with multiple process stations - source, transfer, and target - in which operations such as loading, receiving of substrates and switching between processes can be performed. The unit can handle a wide range of substrate materials such as semiconductor, metals, ceramics, and glass. Ceraus machine is equipped with a high-performance RF power supply and process controller, enabling superior deposition capabilities with its four-mask operation mode. The four-mask mode uses multiple targets simultaneously, allowing variable radio frequency power distribution between each of the targets. This offers excellent control over the deposition rates and film uniformity while allowing technicians to deposit highly diverse thin films with different composition and thickness. Additionally, the tool utilizes advanced deposition insulation and temperature control systems to ensure maximum efficiency and repeatability of the process. The insulation asset promotes uniform deposition by limiting heat loss from the chamber walls during the process, while the temperature control model actively adjusts the deposition temperature for optimum process efficiency. ULVAC Ceraus equipment is designed for high throughput applications with quick substrate loading and switching times, allowing for faster production. Its easy-to-use user interface provides a wide range of functionalities such as recipe inputs, process monitoring, and data acquisition. The system also supports networking, allowing for remote monitoring and access to the parameters of the process. Ceraus sputtering unit is ideal for a variety of advanced applications in the fields of photovoltaics, sensors, LED production, MEMS, and micromachining. It allows for higher deposition rates and excellent quality thin films while providing excellent uniformity, repeatability, a long service life, and compatibility with a wide range of materials.