Used ULVAC Cryo-T12CBH #9380745 for sale

ULVAC Cryo-T12CBH sputtering equipment is a cutting-edge sputtering tool capable of achieving high-rate deposition of thin metal films. This system is designed for cost, power, and process optimization with a vacuum range of 1x10-7~3x10-3 Pa. It is also capable of producing ultra-high purity metal films with excellent uniformity and perfect flatness, with total thickness controllability from 1~3,000 nm. Cryo-T12CBH is equipped with an advanced cryogenic cooling unit, which is used to cool the substrate down to -180°C during the deposition process. This ensures that a uniform film deposition rate over the entire substrate can be achieved, resulting in a more uniform layer thickness. The machine also includes an electron-beam source for substrate pre-cleaning. The pre-cleaning removes surface adhesion and reduces diamond-like carbon layer roughness, improving the surface quality of the substrate prior to film deposition. ULVAC Cryo-T12CBH has a high deposition rate, an independent temperature control tool, plus a uniform gas flow rate, allowing for precise control of the process chamber environment. This results in minimal metal absorption into the substrate and higher deposition rate. The sputtering asset also has an optional pre-ionization chamber, which is used to modify the behavior of gas molecules entering the process chamber. This helps to reduce the problem of plasma desorption from a growing film, resulting in higher structural film integrity. Cryo-T12CBH is capable of increasing film hardness and adhesion strength by using UV Assist, which involves a monitored UV light exposure to the substrate during the sputtering process. This helps to reduce defects in film and improves long-term film reliability and stability, resulting in more even and flat deposition. ULVAC Cryo-T12CBH is designed to meet diverse application requirements, including over layer coating, particle beam deposition, multi-layer film stacks, and low-temperature hydrogen treatment. This sputtering model is one of the most efficient and cost-effective tools for sputtering thin metal films onto a variety of substrates. With its advanced technologies and durability, Cryo-T12CBH is a reliable choice for any sputtering application.