Used ULVAC CS-200 #9156832 for sale

ULVAC CS-200 is a sputtering equipment designed and manufactured by ULVAC, a leader in vacuum technologies. It is designed for deposition of thin films for applications including semiconductor device fabrication, optical components, and data storage. CS-200 is a tabletop, single chamber system utilizing magnetron sputtering. It is easy to install and suited for low to moderately high deposition rates. ULVAC CS-200 utilizes a circular substrate table with up to 6 substrate holders capable of reaching up to a maximum substrate size of 300 mm. Sources are mounted directly above the substrate table and can be independently moved above the substrate surface to create uniform deposits. The unit can accommodate up to four sputtering sources, including both standard magnetrons and rf-sputtering sources. A turbomolecular pump provides the machine with a base pressure of 2 x 10-5 Pa. It is coupled with a rotary vane pump for a total pumping speed of 10,000 L/s. It also features a clean, versatile, and easy-to-use touch screen interface. CS-200 also takes advantage of multiple safety features, including a pressure interlock tool that automatically disables the high-voltage sources when pressure rises above the set point, a motorized shutter that prevents unintentional exposure to the chamber, and a fan monitor to ensure proper cooling of the power sources. ULVAC CS-200 is the perfect choice for low to moderate rate sputtering applications, including those requiring multiple targets. Its advanced features, such as independent movement of the sources and a high-precision pressure interlock asset ensure repeatability and precise film deposition. The reliable, highly efficient operation of CS-200 allows users to get the most out of their sputtering model.