Used ULVAC CS-200 #9313832 for sale

ULVAC CS-200
Manufacturer
ULVAC
Model
CS-200
ID: 9313832
Vintage: 2007
Sputtering system 2007 vintage.
ULVAC CS-200 is an industrial sputtering equipment designed to provide accurate and efficient deposition of a variety of thin film materials onto a wide range of substrates. It utilizes cathodic arc evaporation, which is a form of physical vapor deposition (PVD) to apply depositions of materials onto the target substrate. This system can be used to produce coatings with nano-structured features, which are used in various industries such as electronics, automotive, optical, and biomedical. CS-200 sputtering unit can accurately and quickly deposit different types of thin film materials. It contains an electrically isolated vacuum machine, a 6-arc plasma chamber, a substrate-holder, and a substrate transfer tool. The target material for the arc plasmas is sealed in crucibles and heated up to temperatures higher than those needed for deposition. The heated material is then vaporized and transferred to the substrate-holder, and the arc plasmas act as a shield between the vaporized material and the substrate-holder, preventing contact between the two. ULVAC CS-200 sputtering asset can be customized to suit different thin-film production processes. It also has a variety of tools for controlling and measuring the deposition rate during the process. These tools include the ion-effect-quantification (IEQ) device, which measures the energy of the incident ions; the substrate temperature measurement model, which monitors the temperature of the target substrate; the flow controller, which maintains a stable deposition rate; and the rotatable magnetic field monitor, which measures the plasma field rotating around the substrate-holder. CS-200 can provide uniform thin-film coatings on a variety of substrates, including metal, plastic, ceramic, glass and other materials. It also has a programmable control equipment, which can be used to adjust the parameters of the process such as the deposition rate, uniformity, and composition of the films. This system is cost-effective and reliable, making it a popular choice for industrial sputtering applications.
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