Used ULVAC EBX 2000 #293792915 for sale

Manufacturer
ULVAC
Model
EBX 2000
ID: 293792915
Vintage: 2005
Evaporator 2005 vintage.
ULVAC EBX 2000 is a high-performance sputtering equipment designed for the production of high-quality thin films. It is capable of creating a wide variety of thin-film materials ranging from metals, semiconductor materials, dielectrics, insulators, and even magneto-optical materials. The sputtering system is built on a 3-axis platform, allowing it to offer impressive precision in every step of the deposition process. ULVAC EBX-2000 utilizes two independent sputtering guns, a linear encoder with 0.2 nm resolution, and a gas monitor to improve the accuracy of thin-film deposition. With this setup, EBX 2000 is able to sputter both planar and curved surfaces at a constant rate. EBX-2000 also features an ultra-high vacuum chamber rated at 1 x 10-8 torr. This level of vacuum ensures a high-quality film deposition in each process. It also allows for near-zero contamination of the chamber during the process, allowing for an efficient growth rate and minimal contamination of the substrate. ULVAC EBX 2000 is fitted with a wide range of accessories that allow for flexible substrate processing. These include a carbon-film heater, wafer- alignment plate, robotic transfer arm, and an RF power generator. With these additional tools, ULVAC EBX-2000 is able to improve the rate of sputtering, as well as the uniformity of the substrate. To make sure that the process is completed correctly and with optimal efficiency, EBX 2000 is equipped with a variety of monitoring capabilities that allow the operator to monitor and manage all aspects of the deposition process. This includes remote monitoring of process parameters, the use of a live camera to graph the location of the target for increased accuracy, control of exhaust unit capabilities, and advanced diagnostics with an intuitive interface. In summary, EBX-2000 is a paradigm of sputtering capabilities. It is equipped with innovative features that provide a high level of accuracy and precision in the sputtering process, allowing for a wide range of materials to be used for thin-film deposition. With its ultra-high vacuum machine, numerous accessories, and precise monitoring capabilities, it is an ideal choice for the production of high-quality thin films.
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