Used ULVAC EI-5 #293824737 for sale

ULVAC EI-5 is a sputtering equipment designed for coating thin films over large area substrates. It utilizes an Electron Impact (EI) sputtering process to deposit thin coatings of single or multi-component films onto the surface of flat or curved substrates. The system includes an EI source that utilizes the energy of an electron beam to impact the cathode target and generate sputtered material to form thin-film coatings over the substrate. The EI source can be used to deposit a range of material types including metals, alloys, insulators, and dielectrics. EI-5 sputtering unit features a dual zone chamber design that enables a large area substrate to be coated with high uniformity. The chamber is made up of two vacuum chambers: a main chamber and a buffer chamber. The sample is loaded into the main chamber, and the evacuated buffer chamber helps maintain the pressure in the main chamber during the sputtering process. This enables the coating to form uniformly over the entire sample surface. ULVAC EI-5 machine also features a view port and side access port to allow visual inspection of the sample during the coating process. EI-5 sputtering tool includes a powerful electron beam source with a large area target, capable of producing high film density and uniformity. ULVAC EI-5 also incorporates a programmable RF-power source for optimizing the formation of specific materials. This allows the sputtering process to be customized for different film materials and substrate types. Moreover, the asset is equipped with a magnesium oxide (MgO) ceramic target holder, which is capable of increasing the deposition rate and improving the adherence of the sputtered material to the substrate. Finally, the model includes a workshop vacuum equipment and safety equipment, which includes a safety interlock system. This ensures that the unit is operated safely and that the correct operating procedures are followed. Furthermore, the machine is designed with an ergonomic layout for easy operation, maintenance, and cleaning. Overall, EI-5 is a highly advanced sputtering tool that can be used to deposit thin films of various materials over large area substrates with high uniformity and deposition rate. With its programmable RF power source, MgO ceramic target holder, and advanced safety features, it is an ideal asset for PVD thin-film coating applications.