Used ULVAC Ei-5K #293603151 for sale

ULVAC Ei-5K is a sputtering equipment designed for thin film deposition. It is an industrial-grade sputtering system designed for high throughput. The unit has a dual magnetron sputtering source which can deposit multiple materials onto substrates simultaneously. The machine also includes a rotatable targets and a large coarse pitch which helps in achieving better uniformity. The tool has a large chamber that can accommodate up to 5,000mm^2 substrates, allowing for high throughput and reduced loading time. The substrate mount is motorized and capable of quick loading and unloading of substrates and allows for substrate rotation. The asset features an advanced high-temperature heating element and an adjustable cooling model for the substrate during deposition. The chamber is also equipped with an Class 100 Cleanroom leakage filtration equipment that can effectively remove particles from the chamber and ensure clean operation. The control and monitoring of the system is done with ULVAC original RIB control unit. This allows for real-time analysis, adjustment and optimization of the sputtering recipe parameters during deposition. The machine features a multi-task execution method for simultaneous deposition optimization and fault detection. The RIB control tool also allows for the monitoring of substrate temperature, pressure, arc suppression current and substrate bias voltage. ULVAC EI 5 K has served a variety of different applications such as coating of Si wafer OLED displays, memory devices, and 3D structure devices. This sputtering asset is suitable for any application that requires high throughput and exact control to produce thin films. The model offers maximum flexibility, allowing users to easily adapt the recipe to their desired needs. Ei-5K is a powerful and reliable sputtering equipment suitable for highly precise thin film deposition.