Used ULVAC Ei-5K #293671659 for sale

ULVAC Ei-5K is a high-performance sputtering equipment designed for depositing a variety of thick or thin film layers on substrates both large and small. The system is comprised of a controller, a vacuum chamber, and an ion source. The controller is responsible for coordinating the inputs from the chamber and ion source to maintain optimal unit operation. It includes a user-friendly interface, which enables easy upgrading and full machine control. It also implements robotic applications to provide fully automated layer deposition processes. The vacuum chamber serves as the sputtering area where various depositions occur, including direct current (DC) sputtering, and inert or reactive sputtering. It is designed to handle loads up to three times larger than conventional sputter deposition. The chamber also comes equipped with a water-cooled magnetic plasma source, allowing for increased ionization of target materials. The ion source is required for optimized DC sputtering. It works by accelerating small particles from the target material (source) to the substrate surface. The ion source also serves as a source of energy for sputtering resistance and a source of thermal energy for melting and crystal growth. The ions responsible for the sputter deposition can be focused on any desired region of the substrate. In summary, ULVAC EI 5 K sputtering tool is designed for efficient deposition processes of both thick and thin films on large and small substrates. Powered by a user-friendly controller, a large vacuum chamber, and an ion source, this asset promises optimal performance and consistent results.