Used ULVAC Ei-5K #293824786 for sale

ULVAC Ei-5K is a sputter deposition equipment designed for applications such as thin-film deposition, optical coating, and microelectronic device fabrication. This system has a wide range of capabilities and features, allowing for versatile research and industrial applications. At its core, ULVAC EI 5 K is capable of sputter deposition onto substrates and parts, allowing for a specific uniform conformal coating. This unit is equipped with a 5-kW multi-target multiple arc magnetron sputter source, capable of covering multiple pieces of substrates. A precise power supply ensures the exact amount of energy is delivered to the target, allowing for uniform coatings to be achieved. An in-process monitor monitors the deposition process as it is being conducted, providing real-time feedback on changes to the deposition profile. It also adjusts the parameters according to the load applied, allowing for a precise deposition profile and uniform coatings. Additionally, a process gas control machine is included, allowing for the introduction of argon or nitrogen gas mixtures to better control the sputtering process. Ei-5K utilizes an advanced stage movement tool which allows for rapid substrate loading and unloading, while ensuring a precise movement profile to achieve high uniformity. This is accomplished by using a combination of an automated bridge, a precision x-y stage-positioning asset, and fast substrate transport. EI 5 K is also designed for easy operator interaction. A clear viewing chamber allows for seamless process observation and control. An intuitive HMI (Human Machine Interface) is included to easily control parameters and monitor the entire process. Additionally, software tools for process control and data acquisition are available to analyze process data, helping to ensure quality and reliable results. Overall, ULVAC Ei-5K is a robust thin-film deposition model for a wide variety of applications. It is specifically designed to perform precise and repeatable sputtering with the highest uniformity, precise control, and repeatable results.