Used ULVAC Ei-5K #9302604 for sale

ULVAC Ei-5K sputtering equipment is a state-of-the-art deposition system for creating high quality thin and thick films. It combines traditional and novel coating technologies, allowing it to work with a variety of materials, including metals, oxides, nitrides, carbides and silicides. ULVAC EI 5 K is ideal for applications that require high precision, ultra-low thermal mass deposition and high deposition rates. Ei-5K is fit with an array of substrates, including aluminum, molybdenum, copper, chromium, titanium, alumina and quartz. This sputtering unit is equipped with ULVAC E-line RF/ICP sources that allow for optimization over a wide range of sputter conditions. The machine can also accommodate a wide range of shields, such as E-Shield and E-coat. EI 5 K offers dual chamber operation that allows for deposition of complex materials with high throughput. The magnetron source and substrate stage can be configured in opposite directions allowing for independent bi-directional sputter. Furthermore, the tool accommodates several targets ranging from a single target per chamber to multiple targets per chamber. ULVAC Ei-5K is capable of producing high quality films of various materials taking into account the different parameters such as pressure, deposition rate, temperature and etching rate. For superior performance, ULVAC EI 5 K features a dynamic plasma control asset that provides real-time monitoring and closed loop control of the target flow rate, power and/or substrate bias. Ei-5K is also equipped with a deposition monitor control model, which allows for accurate monitoring of all elements of the process, such as thickness, rate of deposition, and atomic content of the films. This equipment also provides the user with a graphical user interface for easy process setup. In conclusion, EI 5 K sputtering system is an outstanding instrument for the deposition of high quality thin and thick films. It offers a wide range of substrate options and targets, dynamic plasma control, and accurate deposition monitoring. This makes ULVAC Ei-5K an ideal choice for sputtering applications that require precision and ultra-low thermal mass deposition.