Used ULVAC Ei-5K #9305863 for sale

ULVAC Ei-5K is a high-performance sputtering equipment designed to enable precise and reliable deposition of thin films. It boasts advanced state-of-the-art technologies including high-power pulsed bias sputtering and an electron-beam-assault sputtering module. ULVAC EI 5 K is engineered for rapid deposition of a wide range of materials, enabling the formation of metal films, dielectric films, and device structures. Ei-5K features a water-cooled magnetron sputtering source with three-axis motorized motion control for precisely controlled substrate shielding and two separate and independently controlled acceleration and bias sources. Thisallows for uniform deposition of metal and dielectric layers with excellent adhesion and stoichiometry. The integrated high-stability, high-resolution monitoring system ensures precision sputtering of high-quality films. EI 5 K's electron-beam-assault sputtering module provides fine-grain control over the microstructure of metal films deposited. The module precisely controls the bombardment energy and flux of the beam, allowing for reduced stress, enhanced crystallinity, and improved forward scattering of film surfaces. ULVAC Ei-5K's controller featured a variety of pre-programmed recipes for various applications, such as multi-layer stacks for diffusion barriers, high-refractive index layers, and low-k dielectrics. ULVAC EI 5 K also features an improved helium backside plasma module for increased plasma uniformity, as well as advanced magneto-hydrodynamic (MHD) control for stabilized temperatures and reduced fluctuations during platen workpiece seating. The unit is designed for high-throughput processing, enabling rapid, uniform thin-film deposition and deposition of both conductive and non-conductive metal coatings, dielectric films as well as optical layers. Finally, the machine is equipped with advanced safety features, including a platen trip switch, optional RF plasma generators, air pumps, gas delivery systems, and humidity pumps for clean gas delivery. All these features combine to make Ei-5K the ideal choice for high-precision thin-film deposition in semiconductor, optoelectronics, and wear-resistant coating applications.