Used ULVAC Ei-5K #9364553 for sale

ULVAC Ei-5K is a compact size high-precision sputtering equipment that offers outstanding value and performance in ULVAC range of sputtering systems. With a total vacuum of 5.2 × 10-2Torr and a base pressure of 5.0 × 10-7Torr, ULVAC EI 5 K offers extremely high sputtering yields and precise processing capabilities, making it a popular choice for research and production applications. The system has a 1000W RF power substrate heating stage that features front and back controls for the temperature. It also has a 0-60V DC power supply, a 5-axis manipulator, and a high-precision quartz glass displacement gauge with a resolution of 0.1nm. Ei-5K comes with a variety of sputtering source options, including standard items such as Al, Na, K, Cu, Si and Ta as well as 2" and 4" ULVAC-Lonj® sources. The unit can also be configured with an optional plasma combined sputtering source (PCSS) for simultaneous DC/RF plasma sputtering. High-end performance can be achieved through the interface modules that EI 5 K offers. These application-specific modules enable users to perform a wide range of deposition processes, such as reactive sputtering, simultaneous magnetron sputtering, and high-rate sputtering. The user-friendly and convenient operation of ULVAC Ei-5K makes it well suited for any lab, from university labs to industrial production environments. It offers an intuitive user interface with easy-to-understand icons, an excellent vacuum degree monitoring machine, and a data acquisition tool with easy-to-use functions. Equipped with stainless steel and ceramic components, ULVAC EI 5 K also offers excellent durability and long service life. It also boasts exceptional safety, with high shock and vibration resistance and a fully automated vacuum start-up, perfect for any research lab. Overall, Ei-5K is a top-of-the-line sputtering asset that offers outstanding performance and reliability. With its comprehensive range of source options, robust construction and intuitive control model, EI 5 K is an ideal choice for any research or production environment.