Used ULVAC Ei-5K #9364554 for sale

ULVAC Ei-5K is a versatile and precise sputtering system designed to deposit thin films onto a variety of substrates. The system is equipped with a 5-chamber cluster tool, allowing for customizable process configurations to deliver a large range of material deposition options. Utilizing ULVAC-VHS technology, it provides high-quality sputter coating with advanced directional uniformity control and excellent stress control properties. ULVAC EI 5 K is engineered with a mechanical arm that is adjustable to various angles needed to meet different process requirements. It also provides prime pumping capability, with cryopumps located at each of the five chambers for dynamic pumping control. It utilizes a vacuum load lock with quick exhaust shutoff valve for fast deposition process cycling, while its modern controller interface offers enhanced process control and control system diagnostics. To ensure high-fidelity film growth, Ei-5K is equipped with advanced directional uniformity control software. This ensures the perfect balance between stress and deposition rate, allowing for incredibly uniform film deposition and stress control. Multiple stages of plasma monitoring ensure high film quality and greater throughput. It also offers an optional viewport for visual confirmation of the process to ensure process performance is met, as well as a laser interferometer to carry out in-situ process monitoring for larger substrates. EI 5 K utilizes RF & DC magnetron sputtering, as well as Thermal Evaporation, E-beam, and Glow Discharge technologies. In addition, an integrated DC-FIB allows for precise pattern deposition of films on tough-to-coat substrates like MEMS or complex 3D objects. It also makes use of a variety of gas systems, including Argon, Oxygen, Nitrogen, Hexafluoride, Krypton, and others, providing precise material flow control and gas flow patterning. Lastly, ULVAC Ei-5K is specifically designed to be flexible and efficient, allowing for low environmental impact with an orbital sputter chamber. Its modular design is user-friendly and allows for expandable growth with additional chambers or elements, while its fast cycle times and reliable operation make it an ideal choice for many demanding film deposition applications.