Used ULVAC Ei-5K #9402604 for sale

ULVAC Ei-5K sputtering equipment is a high-performance tool ideal for physical vapor deposition (PVD) applications. It can deposit a wide range of materials in a controlled, repeatable way, making it useful for depositing thin films for a variety of semiconductor, optoelectronic, and energy storage devices. The system allows for up to four substrates to be processed in one vacuum cycle. The substrates can range from 2" in diameter up to 8" in diameter. ULVAC EI 5 K allows for a wide range of plasma powers ranging from 0-3000W, with a maximum power range of 200-2000W. This unit also has a wide range of thickness control profiles, ranging from 0.1 - 1000nm, making it a suitable choice for a variety of applications. Its dual-source gravity-fed effusion cells enable separate sources to be used for different pieces of work. This ensures optimum results for each substrate. The cell doors are easy to open for convenient loading and unloading of substrates. The machine utilizes a wide range of process gas combinations, from O2 to Ar/N2, allowing for different kinds of layers. It also allows for an externally exhausted source configuration. This tool comes equipped with a seven-channel mass flow controller, which measures the flow rate of the gases and drives it to the desired pressure. The asset offers a range of deposition modes, including Pulsed DC, DC, and DC+RF sputtering, allowing for better deposition rate control. This model has a robust bell jar vacuum chamber, making it suitable for multiple processes. Moreover, its interlocked safety features ensure that the equipment is safely operated. In addition, the system also features an intuitive touch-screen interface with recipes memory. This makes it easier to configure and execute processes with fewer steps. Moreover, the in-built data logging capability allows for easier evaluation of the process parameters. Lastly, Ei-5K also comes with instructional material, making it ideal for users who are unfamiliar with equipment setups. In conclusion, EI 5 K is a flexible, user-friendly tool that is well suited for a variety of PVD applications. This sputtering unit offers a wide range of thickness control options, as well as different deposition modes. Additionally, its intuitive touch-screen interface allows for easy operation and data logging to ensure accurate results.