Used ULVAC ei-6 #293758600 for sale

ULVAC ei-6 is a sputtering equipment widely used in many industrial and scientific laboratories for thin film deposition. It is an advanced and economical sputtering system, with a compact design. It is especially suitable for thin film deposition on semiconductor, display and solar cells. Ei-6 features an innovative design allowing it to achieve high power density in a very small space, while maximizing process uniformity. The unit includes a 6" diameter circular target, a 6-pocket RF generator with 4 DC sources, an ultra-high speed pulse controller, a gas mass flow controller and a vacuum chuck. The machine is capable of carrying out reactive and non-reactive sputtering processes with a wide range of target materials. ULVAC ei-6 sputtering tool is designed for high speed thin film deposition utilizing the in-line vacuum asset. The sputtering process is carried out in a vacuum chamber with sequential cathode rotation and RF power control. The power supply and control components are built into the model, eliminating the need for external controllers or power supplies. This enhances process stability and increases efficiency. The ultra-high speed pulse controller enables the sputtering process to switch from low to high power in a very short time. This enables thick film deposition in a much shorter time compared to conventional sputtering systems. The 6-pocket RF generator is capable of delivering up to 3 kW of power to the target. The pulse duration is adjustable, allowing for optimized process development. The dual-stage, high temperature vacuum chuck enables rapid heating and cooling of the substrate, allowing for uniform deposition of layers over large areas. Finally, ei-6 sputtering equipment offers a wide range of process options. Additionally, its simple operation, combined with its intuitive software design, make it ideal for start-up laboratories and film developers alike. This sputtering system offers a reliable and versatile solution for thin film deposition.