Used ULVAC ei-7 #9247392 for sale

ULVAC ei-7 is a sputtering equipment developed by ULVAC, Inc., a Japanese manufacturer of vacuum technology. It is a type of thin-film deposition system that deposits thin films on various surfaces to create thin-film coated materials. Ei-7 is a fully automated unit, incorporating a computer control machine and various electronic devices that allow it to accurately control the sputtering process. ULVAC ei-7 tool utilizes Direct Current (DC) sputtering, in which two electrodes are created in an isolated environment and a high voltage is applied between them. The negative electrode is the substrate holder, and the positive electrode is the cathode target. When the voltage is applied, ions of the target material are generated and accelerated towards the substrate, causing the thin film to be deposited on the surface. Ei-7 has a deposition chamber that is partially enclosed for maximum efficiency. The chamber's design features a asset of baffles, which helps keep a uniform deposition rate without cross contamination. The model includes a plasma torch, which enables more even sputtering of the target material. ULVAC ei-7 is equipped with a Liquid Crystal Display (LCD) Panel for viewing the operation status, as well as a Printer Port for logging data related to the deposition process. The equipment also features a Vacuum Interlock System (VIS) which uses a pressure transducer to monitor the pressure in the chamber. This ensures the desired film thickness is achieved and also helps to protect the unit from any sudden pressure changes. Ei-7 utilizes a variety of materials, including metals, oxides, nitrides, and other specialties. It has been designed to support a wide range of application materials and has a special capability for depositing dielectric layers for use in insulated circuits. The machine has also been designed to be very reliable and efficient. All in all, ULVAC ei-7 is a highly advanced and efficient sputtering tool that is capable of creating a variety of thin-film coated materials. It is simple to use, allows for real-time monitoring of the deposition process, and is reliable and efficient.