Used ULVAC EI-7K #293636265 for sale

ULVAC EI-7K is a sputter deposition equipment designed for use in robust industrial settings. It is an advancement on the EI-5 sputter deposition system, offering increased control and performance within a large-scale context. ULVAC EI 7 K is a highly advanced process chamber with the ability to host multiple sputter sources, featuring an active magnetic shielding that enables a clean and consistent deposition environment. This unit is specialized for larger-scale applications, making it suitable for coil manufacturing and other related processes. EI-7K's elite machine-level sputter control allows for higher levels of accuracy when compared to other sputter deposition systems. EI 7 K tool is equipped with a high-performance, active sputter source that is capable of handling loads much higher than average systems. It has the capability to precisely control both the source temperature and the ionization rate, allowing for a more consistent and accurate deposition. It is also able to withstand higher temperatures and pressures when compared with alternative sputter deposition systems. ULVAC EI-7K asset is made up of an active power supply and two magnetic shielding chambers, both of which provide uniform deposition of sputtered particles over the entire area of the substrate. This enables a larger substrate size without sacrificing the quality of the process. ULVAC EI 7 K is also equipped with a high-frequency sputter source, allowing for a fast, efficient and cost-effective deposition process. The model also offers excellent uniformity in the material deposition and can be used to deposit metals, dielectrics, semiconductors, and other thin films. It is designed with a sophisticated communication port, allowing for a fast and secure connection between the equipment and its remote user. It offers advanced data processing capabilities and analysis capabilities, allowing larger-scale applications to be more efficiently and accurately monitored. EI-7K is an excellent, advanced system for large-scale sputter applications. It offers superior performance, with faster processing times, higher resolution, and greater accuracy. The unit also provides reliable data processing capabilities and an advanced communication port, allowing for robust, remote operation.