Used ULVAC EI-7K #9364549 for sale

ULVAC EI-7K is a high-performance sputtering equipment designed for collaboration between the R&D, manufacturing, and production-level activities of a wide range of industries. This sputtering system can be used for a variety of applications such as depositing, etching, and forming thin films. ULVAC EI 7 K is equipped with an electrode-less output and an adjustable substrate-to-target distance, providing a high deposition rate and uniformity of thin films. It features a large working space, allowing for easier operation and a wide range of substrates. The unit is also able to support a number of source materials, including metals, oxides, and compounds. The machine's architecture consists of two main components: the sputtering chamber and the target holder. The sputtering chamber is equipped with a high-efficiency cooler, which helps maintain a uniform temperature in the chamber. The tool is able to perform single or multiple sputtering operations from the same sample, making it ideal for large-scale production. EI-7K is equipped with a number of features that make it an ideal choice for research and production environments. It has a high-performance controller that provides precise control over sputtering parameters such as voltage, pressure, time, and substrate temperature. The asset also features an auto-tuning model that ensures uniform film quality. In addition to its advanced performance capabilities, EI 7 K offers a number of safety features. It is equipped with an automatic gas flow control equipment, which prevents hazardous gases from entering the working area and helps maintain a low residual gas volume in the chamber. The system is also equipped with an intense overall-interlock unit for the protection of personnel and equipment. ULVAC EI-7K is a powerful sputtering machine that is designed to provide superior performance and reliability in a wide range of industries. With its advanced features and safety systems, ULVAC EI 7 K is the perfect choice for research, development, and production level applications for thin films.