Used ULVAC EI-7K #9364551 for sale

ULVAC EI-7K
Manufacturer
ULVAC
Model
EI-7K
ID: 9364551
Wafer Size: 2"-6"
E-beam evaporation system, 2"-6".
ULVAC EI-7K is a sputtering equipment engineered with plasma technologies to provide high yield, high quality continuous production sputtering. It is designed to meet the demands of advanced research and development as well as mass production environments. ULVAC EI 7 K utilizes the arc discharge phenomenona of electro-magnetic phenomena to produce a particle/ionized gas composed of the target material and the sputtering gas used. This ionized plasma is then directed at the substrate sample which is enclosed in a vacuum chamber. EI-7K has a wide range of power options from standard DC sputtering to high frequency pulse sputtering techniques. The DC power options range from micro ampere level up to milli ampere level. Pulse power options are available up to tens of kilowatts peak power. EI 7 K also offers various target shapes and sizes, including flat and rotary targets. It is also equipped with a electrostatic chuck for substrate attachment and has options for temperature control and other special features. ULVAC EI-7K offers precise control and automation in its operations, allowing for precise control of the sputtering rate. The system can sputter at high rates of up to 250nm/sec whilst still maintaining the required surface quality. It is also designed to minimize friction between the target surface and the substrate to reduce contamination and to ensure a high quality film. ULVAC EI 7 K offers high levels of uniformity and homogeneity for the sputtered material. The unit is designed to enable precise control of the deposition rate, thickness and uniformity across the area of the substrate. It also has a variety of detection systems to evaluate the coated substrate and detect any samples that may have been damaged during the process. EI-7K is a reliable and versatile sputtering machine that is suitable for both research and development and mass production environments. With its precision control features, high sputtering rate and customizable features, EI 7 K is well suited to any task requiring the highest level of performance whilst maintaining the highest quality.
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