Used ULVAC Entron EX W300 #293587264 for sale

ULVAC Entron EX W300 is a powerful and versatile high-performance sputtering equipment designed for demanding sputter deposition applications. Its advanced technology offers high rate uniformity, optimum process control and superior repeatability for superior thin film coating performance. ULVAC ENTRON-EX W300 features two sputtering sources, both capable of simultaneous deposition in a UHV chamber. The sources can be used independently or in tandem for coaxial sputtering of two different materials at the same time. Each source features tempered sputtering cathode and programmable wafer stage for both single or dual-target gun operations. ENTRON EX W 300 sputtering system also provides superior repeatability and high process uniformity. The unit's design allows for four different configurations based on the user's process needs. It can be programmed to automatically control media rotation, gas flow, and temperature settings with a high level of accuracy and precision. Users can also customize the machine parameters and settings to upgrade the tool performance on an individual basis. Other major features include: end point detection, material mapping, nonglass mask handling, and temperature control. In addition, ENTRON-EX W300 is designed with an integrated coolant feedback loop and temperature sensors to monitor and adjust the environment temperature within the chamber. This ensures that the sputtered thin film layers attain the best adhesion, uniformity and consistency, while making sure that the chamber is under thermal control at all times. The asset also provides a range of automation options and advanced control capabilities, such as auto recipe, edge sputtering, programmable target bias and multiple wafer deposition. Entron EX W300 can be configured for a variety of thin film applications, including optoelectronic, advanced substrates and semiconductor devices. Overall, ULVAC ENTRON EX W300 sputtering model is an excellent choice for high rate, uniform and repeatable deposition applications. Its advanced automation, superb performance and flexibility make it an ideal solution for thin film deposition processes that require the highest level of process control.