Used ULVAC Entron EX W300 #9282017 for sale

ULVAC Entron EX W300
ID: 9282017
Wafer Size: 12"
Vintage: 2013
PVD System, 12" 2013 vintage.
ULVAC Entron EX W300 is a highly advanced sputter deposition equipment suitable for various industrial applications. The system features a compact design with a maximum size of 78.74" x 68.11" x 32.68", making it a great addition to any workspace. The unit uses an electro-magnetic ion beam source for sputtering, which provides higher deposition rates and lower uniformity than traditional thermal evaporators. The machine is also equipped with a motorized target shifter, rotary feedthrough, and an automated substrate loader, creating a truly automated sputtering process. ULVAC ENTRON-EX W300 is designed to provide exceptional deposition uniformity and rate control. By using ion beam technology in the sputtering process, ENTRON EX W 300 is able to achieve superior deposition uniformity, especially on vertical substrates. The tool also has a wide range of target current adjustment settings, allowing fine control over sputter deposition rate. ULVAC ENTRON EX W300 can also handle a wide range of target materials and thicknesses, ranging from non-magnetic conducting targets, such as copper, to magnetic materials like stainless steel, allowing it to be utilized in a variety of industrial applications. ENTRON-EX W300 is easy to operate and maintain. The user-friendly graphical user interface (GUI) allows for intuitive control of parameters such as substrate rotation speed, target position, and deposition control settings. The GUI also features a data logging function, allowing users to save and monitor deposition processes. In addition, ULVAC ENTRON EX W 300 is built to be highly reliable with minimal downtime, featuring a power regulation asset to ensure stable process conditions, and a dual chamber cleanse model that allows for quick and easy cleaning of the deposition chamber. ENTRON EX W300 is an excellent choice for industries requiring high-quality sputter depositions for applications ranging from coating medical devices to creating thin film capacitors. The equipment is robust, easy to operate, and provides high uniformity, offering an optimized solution to many industrial processes.
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