Used ULVAC Entron EX W300 #9282018 for sale

ULVAC Entron EX W300 is a parallel magnetron-based sputtering equipment designed for precision coating processes and uniform thin-film applications. This large-area parallel-sputtering system features a multi-precursor, single-simultaneous sputter process for improved coating quality and uniform deposition across wide wafers. ULVAC ENTRON-EX W300 unit consists of an integrated load lock chamber, a processing chamber, and independent power supplies for each sputter source. The W300 machine can achieve very high uniformity due to its unique design that includes multiple substrate holders in a single chamber. This can enable a single sputter run to produce uniform thin-film coatings across large areas, such as 150mm wafers. The tool features a Direct Diode Bias power supply for accurate control and precise accuracy to optimize process results. In addition, the W300 features a vertical load lock chamber design that helps eliminate contamination issues. The combination of a powerful DC/RF power supply, dual-source, two-module asset allows for improved thin-film uniformity and non-shadowed part of the model helps enhance uniformity on large-tubular substrates. ENTRON EX W 300 also features a robust vacuum equipment which helps produce high-activity films that increase their service life and reliability. Its high-dynamic process control also makes it an ideal choice for high-precision coating processes. This system is also well-suited for producing optical thin-film coatings such as antireflection and high reflectivity coatings. ENTRON EX W300 is compatible with various substrates which include metals, glass, and ceramics. ULVAC ENTRON EX W 300 is an ideal coating unit for producing thin-film coatings for a wide variety of applications. Its robust design and high precision make it suitable for precision coating processes and uniform thin-film applications. The machine is also well-suited for optical thin-film coatings and is compatible with a wide range of substrates.