Used ULVAC Entron EX W300 #9282019 for sale

ULVAC Entron EX W300
ID: 9282019
Wafer Size: 12"
Vintage: 2007
PVD System, 12" 2007 vintage.
ULVAC Entron EX W300 is a powerful physical vapor deposition (PVD) sputtering equipment used for the deposition of thin film materials onto substrates. It is predominately used in applications ranging from industrial coatings to microelectronics. Its ability to deposit high-purity metallic or oxide thin films from a wide range of materials into small areas with excellent uniformity and film integrity makes it ideal for these applications. ULVAC ENTRON-EX W300 has a variety of features that make its operation easy and efficient. The system has a wide range of sputter source configurations, ranging from a single source to a four-source in-line configuration depending on the application. Furthermore, varying combinations of DC, RF, and pulsed DC sputtering can also be used for optimized film quality. The up to four-source in-line configuration also means that multiple materials can be deposited in the same process, which adds to the versatility of the unit. ENTRON EX W 300 has a wide range of process monitoring features such as the Substrate Temperature Detection (STD) feature and the Laser Density Measurement (LDM) feature. The STD feature utilizes a scanning infrared thermography machine to detect the temperatures on the substrate surface during the sputtering process, and the LDM feature measures the optical density of the deposited film using a laser beam. These features are important to monitor the deposition process and ensure the high-quality film coatings. ULVAC ENTRON EX W300 has an efficient cooling tool which enables a batch process of up to 100 substrates. The design of the cooling asset allows for efficient temperature control and uniform film deposition. The entire model is controlled by a single, user-friendly, touch-screen interface which ensures ease of use. ENTRON EX W300 is ideal for applications in industries such as automotive, energy, and medical due to its high uniformity, excellent film quality, and efficient operation. The equipment's versatility and ability to process up to 100 substrates in a single batch make it an ideal choice for industrial coatings and other thin-film applications.
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