Used ULVAC Entron EX W300 #9282020 for sale

ULVAC Entron EX W300 is a sputtering equipment designed for advanced deposition of thin films. This system utilizes a wide range of efficient and reliable sputter coating techniques for creating high-performance magnetic, optical, transparent and conductive thin films. With multi-arc sputtering technology and several additional coating options, such as dynamic bi-polar pulsed power and reactive sputtering, the unit allows for precise and complex film structures. The machine consists of a main unit with a fully automated control module, an independent coaxial loader/locker unit that offers flexible substrate shapes and sizes, a cathode radio frequency unit and an innovative magnetron control unit. This tool offers superior performance for sputtering high-quality, ultra-thin films. In order to achieve maximum film performance, ULVAC ENTRON-EX W300 can deliver various sputtering processes, such as classic inert sputtering, reactive sputtering, cathode-annular sputtering and cuve-cone sputtering as well as dual and triple-head targets. These processes can be used for creating compound thin films, hard coatings and multilayered films. Furthermore, they enable high deposition rates as well as improved sputtering uniformity. In addition to its sputtering capabilities, ENTRON EX W 300 asset also allows for easy and flexible substrate handling. The users can process substrates of various sizes and shapes with ease, from wafers to rectangular pieces. The substrate stage has a capacitive end-point detection which ensures optimised deposition uniformity across the surface. The model is also equipped with a data logger for reliable data collection which enables users to inspect the data collected with ease. This equipment is also capable of acquiring process data for RGA analysis and optimizing process parameters. Furthermore, the system is capable of performing temperature-controlled processing as it can be equipped with temperature-controlled substrate holders. ENTRON EX W300 is an advanced sputtering unit that delivers high performance, optimised deposition uniformity as well as numerous process options. It is suitable for many applications, from creating optical coatings and thin films to manufacturing of precision components.