Used ULVAC Entron EX W300T #293815144 for sale

ULVAC Entron EX W300T is a powerful and efficient sputtering systems designed for optimal performance in silicon wafer processing. It is a single wafer, single side processing equipment for sputter deposition of thin films. The system has a 300 mm wafer stage with a lower substrate holder temperature range of -70 to 400 degrees Celsius. It has a horizontal deposition chamber design with a six-target design that can accommodate up to five targets, along with a wafer pedestal or jig. Its targets are mounted in the horizontal rotation configuration to allow for uniform deposition of thin films. It has a programmable, high-performance RF power supply with a maximum power of up to 2000W for easy and accurate sputter stripping of the wafer. It is equipped with a high resolution blade scraper and gasket-sealing unit for reliable etching and film quality. It has a gas and pressure control machine that is integrated with the process control software for better film characteristics. The tool has a high vacuum filtration asset for automated deposition processes. It is equipped with a customized upper and lower electrostatic chuck for easy handling of ultra-thin wafers. It has an advanced wafer measurement model that enables the user to measure the thickness and uniformity of the deposited films. Entron EX W300T is designed for easy maintenance and to provide long-term reliability. It also features an optional load lock equipment that allows quick and easy access for sample loading and removing. Overall, ULVAC Entron EX W300T is an excellent sputtering systems for silicon wafers. It provides fast and efficient processing in thin film deposition, and it offers unique features such as programmable RF power supply, high resolution blade scraper and gas control, along with automated deposition control and measurement systems for precise control of films and uniform deposition.