Used ULVAC Entron EX #293597098 for sale

ULVAC Entron EX
Manufacturer
ULVAC
Model
Entron EX
ID: 293597098
Sputtering system.
ULVAC Entron EX is a sputtering equipment used for deposition of thin films and nanomaterials. It is a high-grade, high-precision equipment that offers reliable and consistent results. The system includes a deposition chamber, power supply, and a rotating magnetron sputter gun. ULVAC ENTRON-EX has a maximum thermal power of 140W, allowing users to deposit this material at higher temperatures than other sputtering systems on the market. The unit is capable of sputtering from a wide range of source materials, including metals, semiconductors, dielectrics, and other materials. The ceramic target is featured with a high temperature and high thermal conductivity for outstanding adhesion and lifetime of your coatings. Entron EX can be used for various applications in the area of thin film deposition and nanomaterial fabrication, including nanoimprint lithography, vacuum evaporation, physical vapor deposition (PVD), reactive sputtering, and ion plating for functional, high-performance coatings. It also offers precise sputtering control and high-rate precision coating with enhanced uniformity and thickness control. Additionally, the machine enjoys a wide range of process parameters and offers a wide range of substrate sizes and shapes, making it highly versatile. ENTRON-EX uses a DC Planar Sputter Gun, allowing users to achieve uniform deposition on a variety of hard-to-coat substrates. The tool allows the user to select between both planar and mesh targets to access different sputtering effects when compared to conventional systems. Additionally, the asset includes a multi-nozzle module that allows for faster deposition rates and greater precision. ULVAC Entron EX is also built with a variety of safety features and features a protector hood for operator safety. It also allows for monitoring of temperature, pressure and humidity levels and electric current measurements ensuring optimal model performance. The equipment also has an automatic submerged arc suppression feature which automatically stops sputter deposition if the electric arc is detected outside of the sputter area. All these features make ULVAC ENTRON-EX a reliable and economical piece of equipment for any application that requires sputtering. It can provide reliable and consistent results due to its precision and flexibility and is capable of fabricating a range of nanomaterials and thin films.
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