Used ULVAC Entron N300 #9314071 for sale

ULVAC Entron N300 sputtering equipment is a reliable and efficient tool for producing thin films for High Technology worldwide. Using a patented ETES method, Entron N300 is able to deposit films of various materials, from U-Ni to AuGe and more, while maintaining high uniformity and process repeatability. ULVAC Entron N300 enables the precise control of film thickness and composition with an easy-to-use operation system and intuitive software interface. It also allows the independent control of two main sputter sources, making it ideal for multi-layer deposition processes. The unit is equipped with a 300mm diameter End-Hall magnetron source, and features a Turbo core, a high-performance mechanical pump, and a high-efficiency plasma generator. This configuration enables high uniformity and efficiency of uniform deposition, with minimum total emissions. Entron N300 is designed for TFT LCD, FPD, and related markets, and achieves a substrate uniformity of better than ± 0.1 micrometers along the entire 300 mm wafer size. On account of its high-precision plasma generation machine, ULVAC Entron N300 is capable of depositing films with a wide range of optical characteristics, such as transmittance and reflectance. Furthermore, Entron N300 provides a high-quality film with minimal compositional or structural defects. Its unique Ultra High Power Mode increases deposition rate up to 3X without compromising film thickness uniformity. The stable plasma environment ensures an accurate control of the deposition kinetics, which can also be monitored by an automated monitor tool. Finally, ULVAC Entron N300 is backed by ULVAC extensive knowledge and experience in sputtering process engineering. All of its components are deemed by experts as reliable and efficient while keeping maintenance to a minimum. This makes Entron N300 an ideal choice for R&D and industrial processes, as it enables the fabrication of uniform thin films.