Used ULVAC Entron T5 #9020575 for sale

ULVAC Entron T5 is a sputtering equipment developed by the Japanese manufacturing company ULVAC. It is a compact, spin-on system designed to coat large substrates with thin film materials. Entron T5 operates using the sputtering process, in which target atoms are shot onto the substrate to create thin film layers. ULVAC Entron T5 is equipped with a mass-flow controller and a parabolic-shaped single plane magnetron target. This configuration provides an efficient, high-throughput deposition process. The unit also includes a power supply unit with a maximum output of 5000 W to ensure the maximum film quality and deposition rate. Entron T5 is also capable of finely controlling the temperature inside the deposition chamber. This is achieved through a forced-air cooling unit and by electric heaters embedded around the wall of the chamber. This allows for precise temperature control for reproducibility and quality assurance. ULVAC Entron T5 also features a sputtering process monitoring machine, which monitors the vacuum pressure, power level, and film thickness at all times. This allows for easy monitoring of the deposition process. It is also equipped with a gas injecting unit that allows for the controlled introduction of reactive gases into the deposition chamber. In addition, Entron T5 offers a wide range of sputtering targets, making it an ideal choice for various types of material deposition requirements. It is suitable for deposition of metals, alloys, and dielectric materials. Furthermore, the large chamber of this sputtering tool can accommodate substrates up to 800mm×1000mm. To ensure the highest quality, ULVAC has incorporated the greatest standards of precision into the manufacturing process. The magnetic field is stabilized and generated with stable auto-tuning circuitry, while the ultra low-vacuum processes are monitored and stabilized with ULVAC advanced software. Overall, ULVAC Entron T5 is a compact, high-performance, and economically priced asset that provides efficient and precise thin film coating. Its features make it an ideal choice for a wide range of thin film deposition applications.