Used ULVAC Entron #9038422 for sale

ULVAC Entron is a high-end sputtering equipment designed for sputtering thin films. It is a well-engineered tool for sputtering thin film layers that may be used for a variety of applications, including semiconductor production, thin film research and development, and industrial processes. The system is based on a double-magnetron configuration. This means the magnetrons are "locked" together and share the same sputtering arcs. The magnetrons generate sputtering arcs with controlled beam divergence and reduced ion bombardment of the substrate. The whole unit is powered by a high current DC source. Entron has been designed to provide uniform, high quality sputtered films with excellent stoichiometric properties. It is also designed for optimal deposition rates and improved throughput. Its ultra-vacuum chamber is optimized for optimal uniformity of sputter deposition. ULVAC Entron has built-in flexibility allowing deposition of multi-layer stacks of high quality films. It is also possible to sputter metals, alloys, dielectrics (e.g. Al2O3 or SiN4) and oxide layers with good electron transparency, making it ideal for use in photovoltaic and electronic applications. Entron has several additional features which make it a great choice for thin film development and production. It has several high-end features such as precision-controlled film transport, advanced pressure and temperature monitoring, and automated endpoints detection. Plus, ULVAC Entron has an integrated fluidic control machine, enabling efficient blending of active sputtering gases while maintaining a high degree of process control. Entron is also equipped with a high-performance, robust control tool. This asset includes several features such as automated thickness control of multi-layer films, maintenance and maintenance records storage, batch processing functions, and advanced ion energy and sputtering voltage optimization. This model is highly capable of precision process control, allowing for feedback-based optimization of thin film deposition. Ultimately, ULVAC Entron is an excellent solution for operators looking to sputter high-quality thin films. Its dual-magnetron configuration and precision-controlled features make it perfect for manufacturers and research laboratories alike. Its precision-controlled deposition rate ensures that films are of the highest quality, providing uniform and accurate results. Its flexibility allows for development of complex stacks of multi-layers, and its pre-programmed functions make Entron an efficient solution for high-production runs.