Used ULVAC Entron #9150538 for sale

ULVAC Entron
Manufacturer
ULVAC
Model
Entron
ID: 9150538
Wafer Size: 12"
Vintage: 2004
Physical vapor deposition system, 12" Process: Metal 2004 vintage.
ULVAC Entron is an advanced sputtering equipment designed for deposition of thin film materials. The system utilizes direct current, pulsed DC, and directed sputtering to provide a variety of deposition processes in one unit. It is also designed for precise control over temperature, pressure, and gas flows to ensure optimal film deposition. Entron has a compact design that gives it clear advantages over other, larger sputtering systems. With its small footprint, and high power capability, it is suitable for research and laboratory applications as well as industrial production. The machine can be configured with up to four sources of power, with each source capable of delivering a wide range of power levels. Additionally, all sources can be operated independently or in combination to provide accurate control to enable precise deposition. to provide a uniform and dense film. To ensure optimal film quality, ULVAC Entron can be equipped with several options including an inert gas supply, cryopump, and temperature control. The tool is also compatible with multiple gas and submersible pumps to enable the use of reactive gas. Entron asset also offers the highest degree of process stability and the lowest number of gas leak points. This ensures minimal contamination and a long-term repeatable sputter deposition process. Furthermore, the model has a low power consumption compared to other sputtering systems. ULVAC Entron is a versatile equipment suitable for multiple applications. Examples of applications include the deposition of dielectrics, metals, ceramics, or even transparent conductive materials. Moreover, it offers high repeatability and accuracy when thin film deposition. Given all these advantages, Entron is a good choice for both small-scale and large-scale sputter deposition projects requiring reliable and repeatable results.
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