Used ULVAC Entron #9159056 for sale

ULVAC Entron is a sputtering equipment used in a variety of industrial applications. It is designed for producing thin metal or insulating oxide films on semiconductor wafers and other flat substrates. Entron system uses a high-frequency electric field to generate an arc between a metal sputter target and the substrate, resulting in the removal of material from the target and the deposition of material onto the substrate. The electric field also serves to uniformly heat the target and enable the 3D shape of the substrate to be scanned. ULVAC Entron sputtering unit is equipped with a range of features and technologies to ensure higher process repeatability and uniformity. These include advanced process control algorithms, electronic pressure control, enhanced plasma stability, and process uniformity compensation. Entron machine includes the Multi-Source DC-Magnetron sputtering technology which enables high deposition rate with minimized damage to the sputter targets and substrate. The Dual Frequency technology allows for independent control of the magnetron power supply-providing higher deposition uniformity. The patented Substrate Guide manipulator provides high accuracy and makes it easier to switch between flat substrates and substrates with complicated 3D configurations. ULVAC Entron tool offers many advantages over traditional sputtering systems, including improved process repeatability, greater uniformity, lower power consumption, and higher deposition rates. Its compact design also makes it ideal for high-volume production in very limited spaces. Entron is an ideal sputtering asset for a variety of applications, including metalizing semiconductor wafers, IC packaging, electrodes, and microelectronics, stainless steel and magnesium substrates, and decorative films. It is also suitable for a wide range of materials, such as alumina, chromium, iridium, molybdenum, and titanium.