Used ULVAC MLX-3000N #9053707 for sale

ULVAC MLX-3000N is a sputtering equipment designed for research and development applications. This system allows for deposition of a variety of thin-film materials including metals, insulators, and semiconductors. It utilizes ULVAC proprietary MGP technology, which features three evacuated chambers - a Target Chamber, a Reaction Chamber, and a Coating Chamber - all connected to a single pump. This modular design allows for a wide range of substrate sizes, shapes, and configurations. The Target Chamber is outfitted with ULVAC patented magnetron sputtering source technology. The nine large magnets on the sputtering source combined with an alkali halide ion source allow for maximum sputtering through-put under non-vacuum conditions with virtually unlimited source life. The highly uniform ionized plasma is generated within the Target Chamber by the ion source. This increases material usage efficiency while allowing for homogenous deposition throughout the whole substrate area. The Reaction Chamber is a high-pressure reactive chamber that can be used to introduce gases such as amines, alkanes, or oxygen into the sputtering process. It features advanced optical monitoring capabilities, allowing researchers to assess film properties during sputtering. Finally, the Coating Chamber is the output of MLX-3000N unit. Here, the metal film, coating, or other nanostructure generated by the sputter process is deposited onto the substrates. The systems' high material throughput capability allow for large substrate sizes and high-precision coating results. ULVAC MLX-3000N also employs a number of sensors to monitor deposition process conditions in real-time. These sensors include a pressure gauge, vacuum controller, and substrate temperature monitor. These components provide scientists and researchers with detailed feedback information and allow for quick process optimization. MLX-3000N is an advanced sputtering machine designed to meet the needs of researchers and developers. It offers a range of advantages such as high throughput, wide-area coating, and high-precision deposition for a variety of materials. Its modular design and advanced sensors make it an ideal choice for advanced application development.