Used ULVAC MLX-3000N #9156850 for sale

ULVAC MLX-3000N is a high-performance sputtering equipment capable of producing high-quality thin films for many different uses. The system has a multi-chamber construction, with a hexagonal main chamber, a side chamber, and a bottom chamber, providing maximum flexibility. It offers a variety of sputtering sources, such as circular and rectangular cathode, dual magnetron source, and unbalanced magnetron source. It employs advanced features, such as advanced onboard ICRF power supply, multiple plasma monitoring options, and closed-loop process control. MLX-3000N is a fully programmable unit with adjustable deposition rate, ion bombardment intensity, and width control, allowing for precise pressure control and superior film quality. The machine also includes an optical emission spectrometer for real-time process monitoring and control. ULVAC MLX-3000N is capable of producing a variety of thin films, including metals, dielectrics, oxides and nitrides. The tool is designed to handle both low-pressure and high-pressure reactive sputtering processes, allowing for a wide range of applications. It is also fully compatible with ULVAC EXA900 series of PVD deposition systems, allowing for quick transfer of processes to the asset. The integrated annealing station enables depositions of very thin metallic films, while the cooling components help maintain film uniformity. Finally, MLX-3000N utilizes a variety of software packages which allow users to control the entire model from a single interface. The software is fully compatible with ULVAC ICRF power supply and utilization of the GLASS program speeds up the development and commissioning time of complex processes. ULVAC Sputter Process Monitor (SPM) software also provides users with complete control over the entire deposition process in order to maximize process reliability. In conclusion, ULVAC MLX-3000N is a high-performance sputtering equipment which offers a wide range of features and capabilities to meet the desired requirements for a variety of applications. The system's multi-chamber construction, advanced onboard features, programmability and software compatibility make it an ideal choice for high-precision thin film deposition.