Used ULVAC MLX-3000N #9266533 for sale

ULVAC MLX-3000N is a high-performance sputtering equipment designed for applications in semiconductor device fabrication. This system is composed of a power supply, an RF generator, a process chamber, a substrate stage, and various additional components. The RF generator offers up to 3,000 watts of power and is capable of providing bi-directional, pulsed DC and pulse bias power supplies. The RF generator also has a high-power pulse-bias mode for improved process control. The process chamber is a two-dimensional planar exhaust unit which allows for fast process deceleration. The process chamber can process wafers up to 200mm in size. It supports several sputtering processes, including film deposition, pre-clean, post sputter, and multi-target sputtering. This multifaceted chamber is outfitted with a unique ion-pumping machine to achieve high processing speeds and uniformity. The substrate stage is designed to deliver constant, reliable substrates for ambitious application requirements. This stage has an integrated active stabilization tool to ensure precise wafer positioning. It also features an automated wafer loader for quick substrate loading and unloading. Additionally, MLX-3000N can be outfitted with additional components for increased process flexibility. A substrate heater and an Asahi UNAX atomic oxygen generator can be integrated into the chamber for more advanced oxidation and annealing applications. An in-situ polarized probe can also be added for improved process monitoring. In conclusion, ULVAC MLX-3000N is an advanced sputtering asset that offers high power, precise processing, and process flexibility. Its precision power supplies, process chamber, and substrate stage allow for a wide range of applications in semiconductor manufacturing. The additional components enable even more process applications, from oxidation and annealing to process monitoring.