Used ULVAC MLX-3000N #9271145 for sale

ULVAC MLX-3000N Sputtering Equipment is a state-of-the-art sputtering system designed for semiconductor chip production. The primary function of this unit is to deposit thin films of various materials onto wafers and other substrates. This machine is built with a variety of features that ensure the highest quality film deposition on each wafer. This tool is composed of three main components: the vacuum chamber, the target chamber, and the cathode sputtering sources. The vacuum chamber is designed to be among the most efficient possible. With its multi-zone isolation and pumping asset, the chamber maintains vacuum pressures of 10−8 Torr and lower, offering excellent uniformity over the entire substrate. The target chamber, which houses the sputtering target, is designed to be extremely stable, offering repeatable and predictable performance. Finally, the cathode sputtering sources ensure a uniform and predictable deposition of material onto the wafer. MLX-3000N delivers high quality, repeatable results that are essential for semiconductor chip production. It provides a variety of features that ensure the highest quality deposition possible. With its effective gas purging model, the equipment is capable of achieving particle levels of one particle in a million cubic centimeters. The built-in deposition uniformity monitoring system ensures that the film thickness is uniform down to a nanometer level. This unit also includes a high precision monitoring machine that is capable of measuring film thickness with nanometer accuracy and monitoring the temperature inside the chamber with a high level of precision. When it comes to controllability, ULVAC MLX-3000N has several user friendly features. Controlled variable power supplies allow precise control of the sputtering process, resulting in consistent film thickness and uniformity. An efficient remote control tool allows users to easily adjust settings from their computer. This asset also includes built-in safety systems that prevent overheating and ensure that the sputtering process remains stable. Finally, MLX-3000N comes with a variety of features that make it an optimal choice for semiconductor chip production. The model is equipped with an easily accessible loading station for substrate loading and unloading. In addition, this equipment is designed to be cost-effective, with a low cost per deposition cycle. ULVAC MLX-3000N is an excellent choice for those in need of a reliable and cost-effective sputtering system for their semiconductor chip production needs. It's combination of features and precision make it an ideal choice for reliable and repeatable film deposition.