Used ULVAC PME-200 #9218797 for sale

ULVAC PME-200 is a versatile sputtering equipment used for depositing thin films onto a wide range of substrates. This system is popular among research laboratories for depositing a variety of materials such as alloys, metals, and insulators with controlled thicknesses and uniformity. PME-200 consists of a main chamber covered by a 3-layered vacuum-tight equipment case and a drive mechanism. This main chamber is equipped with three sputter sources which can be configured in either parallel magnetron or crossed field sources. It also has a source support structure and a matching style cathode assembly which functions as the connection between the sputter sources and the substrate holder. The substrate holder is responsible for supporting substrates during deposition and can be configured for either flat or cylindrical substrates. It consists of a holding frame, heaters, and a focus ring. The heaters are used to adjust the substrate temperature and the focus ring provides an adjustable area for the deposition sources. ULVAC PME-200's controller includes a touch panel with an LCD display, backing memory, programming options, and source control. This source controller can handle up to five deposition sources with a variety of sputtering gases. This unit has a sophisticated thermal control machine with an PID feedback loop that allows for precise temperature stability and uniformity. Temperature control can be controlled using the focus ring with a choice of argon, nitrogen, helium, and other gases. PME-200 is equipped with an exhaust management tool to ensure that particles are safely removed. This asset has an exhaust port for effective ventilation. It is also equipped with a vacuum pressure sensor so it can accurately measure the deposition process pressure. ULVAC PME-200 is a versatile deposition model that has multiple sputter sources and a sophisticated thermal control equipment. This system allows for depositing a variety of materials with controlled thicknesses and uniformity on both flat and cylindrical substrates. The advanced thermal control and exhaust management unit ensures a safe and efficient process with a wide variety of gases.