Used ULVAC SDH-4550L #9313962 for sale
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ULVAC SDH-4550L sputtering equipment is a high-performance, fully automated vacuum deposition equipment designed for applications such as low-temperature semiconductor deposition and optical thin film coating. It uses an array of advanced features and cutting-edge technology to deliver productions of consistent and uniform quality. SDH-4550L is equipped with an in-line sputtering deposition system, allowing multiple concurrent sputtering targets. This allows films to be deposited in different material combinations. ULVAC SDH-4550L features automatic source loading and wafer transfer mechanism, providing a fast and efficient production unit. The machine is capable of sputtering with up to five targets in an in-line array. This sputtering array can be configured into two separate sputtering lines for multi-target operations and multi-material compositions. The integrated computer control tool of SDH-4550L allows users to select, program and monitor various sputtering parameters for each target. ULVAC SDH-4550L also features powerful vacuum evacuation and valving systems, allowing rapid, high quality vacuum cycling. It utilizes dual-stage rotary vane pumps, creating fast and efficient vacuum evacuation. It also includes high-efficiency valving systems, providing accurate control of substrate temperature and gas flow during deposition. With these excellent features, SDH-4550L is capable of producing thin films with high reproducibility and homogeneity. In addition, ULVAC SDH-4550L employs an advanced RF substrate bias asset, allowing for stabilization of thin film layers, improves in-plane crystal structure and prevents migration of particles. This model also includes a secondary bias generator, allowing for maximum flexibility while tuning substrate bias conditions. This feature is especially useful for producing thin layers of complex oxides. SDH-4550L sputtering equipment also offers advanced cooling and temperature control. The system is equipped with an efficient water-cooled heat exchanger and temperature control module, allowing for precise adjustment of process temperature during sputtering. This allows users to produce thinner films, reduce waste and maintains uniformity of sputtered layer thickness. Overall, ULVAC SDH-4550L sputtering unit is an efficient, automated and advanced deposition machine, offering reliable production of thin films. With its multiple sputtering targets and advanced vacuum and cooling systems, SDH-4550L is a perfect choice for those needing efficient and quality deposition.
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