Used ULVAC SDP-570 #9411766 for sale
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ULVAC SDP-570 is a state-of-the-art, versatile sputtering equipment used in thin film deposition applications. It is a DC (direct current) sputtering system designed with a small footprint, making it ideal for small applications. As a magnetron sputtering unit, it offers impressive power and high deposition rates, ultimately resulting in high quality, uniform thin films. The machine is designed with a fully enclosed chamber, allowing for an improved environment where sputtering occurs. It has a large, easily adjustable process area and is capable of handling a variety of materials. A built-in vacuum pump allows for improved stability and repeatability. This sputtering machine is ideal for Deposit Temper Evaporation (DTE) and physical vapor deposition (PVD) processes. SDP-570 sputtering tool also features high-precision mechanical design elements. Its seven-axis goniometer allows users to precisely control and adjust the angle, tilt and spin of the substrate to ensure consistent film formation. Its high-precision planetary motion systems ensure smooth and accurate substrate movements during the process. In addition, ULVAC SDP-570 offers users an extensive range of process parameters. It is equipped with a dual frequency DC power supply, giving users the ability to adjust power from 100 to 10,000 watts. Its controllers feature both RF (radio frequency) and DC sputtering for better control of the deposition parameters. Its 3-zone temperature control enables users to maintain a rigid process temperature. SDP-570 sputtering asset also includes advanced safety features. The machine is equipped with an array of sensors to detect any changes in the process and provide immediate alerts to the user. Additionally, it features an emergency stop button, allowing operators to end the process quickly and safely if needed. Overall, ULVAC SDP-570 offers superior performance, uniformity and accuracy. Its range of process parameters, advanced safety features and DC/RF sputtering capabilities make it an ideal choice for thin film deposition applications.
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