Used ULVAC SDP-S 1550VM #293753561 for sale
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ID: 293753561
Sputtering system
Can be coated with SiO2/Nb2O5 high-penetration glass
SiO2/Nb2O5 high-penetration glass + ITO
MoNb/AlNd/ MoNb film
SiO2+ITO.
ULVAC SDP-S 1550VM is a high-performance, advanced sputtering equipment designed for precise thin film deposition in a variety of research and industrial applications. This system is equipped with cutting-edge technology to ensure superior film quality, high throughput, and excellent process control. SDP-S 1550VM features a versatile configuration that allows for sputtering of a wide range of materials, including metals, oxides, and nitrides. This unit is capable of depositing films with exceptional uniformity and thickness control, making it ideal for applications that require precise layer deposition, such as semiconductor device fabrication, optical coatings, and sensor development. One of the key features of ULVAC SDP-S 1550VM is its large deposition chamber, which accommodates substrates of various sizes up to 200 mm in diameter. This enables users to deposit films on a range of substrates, from small samples for R&D purposes to production-scale wafers. The machine is also equipped with a high-precision substrate stage that ensures accurate positioning and rotation during the deposition process, leading to consistent film quality across the entire substrate surface. SDP-S 1550VM incorporates a magnetron sputtering source, which generates a plasma composed of metal ions that are sputtered from a target material onto the substrate surface. The magnetron source is equipped with advanced power supplies and control systems that allow for precise tuning of the sputtering process parameters, such as target power, gas flow rate, and pressure. This level of control enables users to tailor the film properties, such as composition, thickness, and morphology, to meet specific requirements for their application. In addition to magnetron sputtering, ULVAC SDP-S 1550VM can be configured with multiple sputtering sources, including RF and DC sputtering, allowing for co-sputtering of different materials and the deposition of multi-layered films. This capability enhances the versatility of the tool and enables users to create complex film structures with unique properties, such as optical filters, barrier coatings, and magnetic thin films. SDP-S 1550VM is equipped with a user-friendly interface that provides intuitive control of the deposition process through a graphical touchscreen display. The asset comes with pre-programmed recipes for common deposition processes, as well as the ability to create custom recipes tailored to specific material systems and film properties. Real-time monitoring and data logging features allow users to track the deposition process parameters and analyze the film characteristics for quality control and optimization. Overall, ULVAC SDP-S 1550VM is a state-of-the-art sputtering model that offers advanced capabilities for precise thin film deposition in a wide range of research and industrial applications. With its high-performance features, versatile configuration, and user-friendly interface, this equipment provides researchers and manufacturers with the tools they need to achieve superior film quality and meet the demanding requirements of modern thin film technologies.
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