Used ULVAC SH-450-T10 #9156843 for sale

ULVAC SH-450-T10 is a High Power DC magnetron sputtering equipment designed for deposition of film materials in semiconductor device manufacturing. It features a single spindle and an RF bias substrate power supply. SH-450-T10 has a compact design that allows for easy installation and use. The system utilizes a high power RF magnetron that can provide up to 450 W of DC power for film deposition. The RF magnetron sputter source is adjustable and has two independent operating modes: linear mode and full burst mode. In linear operation mode, ULVAC SH-450-T10 can operate at lower, optimized power levels for uniform film thickness and repeatable performance. In full burst mode, the unit can achieve higher deposition rates for larger area deposition. The machine also features a Pulse Mode arc suppression tool, which reduces arcing associated with high power operation and an enhanced substrate cooling asset. SH-450-T10 features an RF Bias Source that allows for reduced sputter rates and improved film adhesion. The RF bias power has independent control of up to 400 Watts, offering excellent control over the ion flux during the sputtering process. Additionally, the RF power modulation can be used to maximize deposition uniformity across the target. The model includes a secure data management equipment, which is capable of storing all data on incoming wafers, including deposition rate, thickness, and cycle time. This data is stored securely, allowing authorized personnel to access and adjust settings for individual wafers. The system also includes a fully automated central control unit with pre-defined recipes. ULVAC SH-450-T10 magnetron sputtering machine is a high power DC sputtering tool that provides excellent film deposition characteristics. The adjustable RF magnetron, RF bias source, and automated central control asset provide excellent precision and reproducibility, while the data management model allows for secure data storage and retrieval. The equipment offers excellent performance and repeatability for high volume production.