Used ULVAC SH 450 #9132015 for sale

ULVAC SH 450 Sputtering Equipment is a high performance sputtering technology used in today's semiconductor, flat panel display, and data storage markets. Engineered to maximize throughput and yield, it is ideal for both research and volume production. Its large capacity (450 mm) allows for higher yields and determines the total area of the parts that can be processed at once. Additionally, SH 450 system boasts a wide range of process operations, making it extremely efficient in various kinds of production. Powerful and precise, ULVAC SH 450 is equipped with a robust array of features such as its 4-column automatic loader, which allows for high-capacity material loading. The machine also features a large-capacity, low-vibration sputtering chamber, and an adjustable vacuum pressure control unit for accurately controlling the work pressure. In line with ULVAC highest quality standards, it also possesses a vibration-free, contamination-free environment. For ease of operation, SH 450 is equipped with a user-friendly touch panel interface. The machine also offers a real-time monochromator-based arc light monitoring tool, which uses a wavelength-selective lamp to monitor the sputtering process in real time. This feature is essential for ensuring that volatile substances and oxide layers are removed from the substrate. ULVAC SH 450 is capable of performing a wide range of processes, including sputtering, vapor deposition, bonding, etching, and abrasive polishing. It is compatible with a full range of substrates such as silicon, gallium arsenide, glass, metal, quartz, and other materials. Its versatile architecture also allows for customization of various process parameters, including the pressure, temperature, gas concentration, and flow rates. As an added bonus, the asset also features an integrated process management model, which allows for process optimization and automation. Overall, SH 450 Sputtering Equipment is an impressive tool designed to maximize throughput and yield. Its robust features, high capacity, and range of process operations make it ideal for both research and production. Additionally, the easy to use touch panel interface and intuitive gas flow control system make it an ideal choice for any sputtering application.