Used ULVAC SIH-3030 #9067203 for sale

ULVAC SIH-3030 is a magnetron sputtering equipment used for various physical vapor deposition (PVD) techniques. It is designed for superior position accuracy, excellent uniformity and enhanced stability in both single and multiple target processes. The all-in-one design of SIH-3030 sputtering system includes a standard loadlock and an adjacent sample boat that is fully integrated into the chamber. The large chamber provides a generous axial length of 349 mm and two optional hinge doors for easy access. Its adjustable, closed-cycle, variable-frequency turbo-molecular pumping unit ensures a minimum base pressure of 1.6x10-4 Pa in the sputtering chambers. ULVAC SIH-3030 is capable of using up to three sources of sputtering simultaneously and can sustain continuous cathode loading operation for long-term application. SIH-3030 sputtering machine has a wide range of adjustable operating parameters to maximize deposition rate and uniformity. These parameters include temperature control from 0-400 C, adjustable source-to-substrate distance, and the ability to choose between a fixed DC power supply or an optional AC substrate bias for improved adhesion and surface texturing. The tool also includes a programmable electrostatic shield to optimize ion bombardment levels for better film uniformity. For enhanced substrate handling, the asset comes standard with a substrate cooling line and an optional adjustable substrate heating line for improved material desorption. ULVAC SIH-3030's advanced safety model can be used to monitor chamber conditions and protect components from potential power surges. In addition, the equipment's touch-screen controller ensures straightforward operation and quick time to production. SIH-3030 sputtering system is ideal for use in research and production of films for the semiconductor, aerospace, automotive, and flat-panel display industries. Its advanced features and reliable performance make it an excellent choice for a variety of PVD applications.