Used ULVAC SIV-200 #293622781 for sale

ULVAC SIV-200 is an advanced sputtering equipment designed for high-quality thin film deposition of layers onto surfaces such as substrates and wafers. The system features a variety of deposition techniques and processes, including AC magnetron sputtering, DC magnetron sputtering, and bias sputtering. It also has multiple targets, including aluminum, stainless steel, and metal-oxide targets. All targets use distortion-free magnetic fields to achieve precise sputtering and uniform coating characteristics. The unit's RF frequency generator and advanced controlling systems provide precise precision, allowing for high throughput with maximum uniformity. Capable of working under ultra-high vacuum (UHV) conditions, SIV-200 sputtering machine ensures both superior particle free deposition and precise control of the ambient sputtering parameters. It features nanoprecise dc control, precise pulsing techniques and adjustable radio frequency power down to the millisecond level. This precise control allows the tool to apply materials with a uniformity of 1mil/disc. Additionally, the asset utilizes a pressure controller to maintain steady pressure during deposition, ensuring consistent film performance. Built with a larger chamber volume, ULVAC SIV-200 can accommodate multiple substrates on a single tray, reducing process time significantly. SIV-200 features high-precision laser interferometer mounted on a rotary stage for unparalleled non-contact optical thickness measurement. It also has advanced vision-camera model for critical substrates and wafer inspection capability, providing precise surface analysis and uniformity measurements. This advanced vision-camera equipment can be used for live monitoring of the deposit process and for quality control. Not only does ULVAC SIV-200 provide for superior deposition and precise control, but also for easy accessibility. To facilitate maintenance, the chamber door includes a lift door for easy access to process chamber components, making it an ideal choice for research and development laboratories. In addition, the climate-controlled environment minimizes the need for regular maintenance increasing system reliability and availability. Overall, SIV-200 sputtering unit is a superior tool offering superior sputtering with precise control and easy accessibility. Its advanced features allow for nano-precise dc control, accurate pulsing techniques and adjustable radio frequency power, as well as a high-precision laser interferometer and vision-camera machine for critical substrate and wafer analysis. This tool offers optimal conditions for highly precise and uniform coatings with high throughput and low maintenance.