Used ULVAC SIV-200S #293637679 for sale

ULVAC SIV-200S is a single-chamber, DC magnetron sputtering systems designed for advanced semiconductor device research and development. The equipment is capable of producing high performance thin films with deposition rates of up to 5 Å/sec, over a range of substrate materials including glass, ceramics and other materials. SIV-200S features a high-efficiency gas delivery with a built-in molecular beam line for the deposition of high performance materials. The dual-ended magnetron sputtering configurations support up to four cathodes and two anodes, allowing for greater flexibility in sample deposition. In addition, the use of an independent linear variable differential transformer (LVDT) allows for individual control of the linear bias on each cathode separately. This feature can be used to improve uniformity in the substrate material and reduce charging effects. The furnace module of the system is equipped with a range of high-temperature Heating Ovens (HOTs) and hot plates, making it a suitable option for coating temperature-sensitive materials. The Hot Plate has a temperature range of up to 1000 °C, with an optional Thermocouple attachment available for highly accurate temperature monitoring. The unit includes an advanced RF generator for controlling the frequency, magnitude and duration of ion bombardment during etching and deposition processes. ULVAC SIV-200S is highly adaptable to different experiments, allowing for a range of features to be adjusted with a full-function control software suite. This includes the ability to program multiple tasks, monitor sample analysis in real time on up to four wafers, and select from a range of available recipes for specific thin film specifications. Overall, SIV-200S is a reliable, easy-to-use machine designed to meet the requirements of advanced semiconductor research and development. The tool's ability to support individual cathode control and variable frequency RF sources make it capable of producing a variety of thin film effects, including exceptional film uniformity, low charging, and high rates of deposition.