Used ULVAC SIV-200S #9162025 for sale

Manufacturer
ULVAC
Model
SIV-200S
ID: 9162025
Sputtering systems (6) Substrate holders, 4" MFC: Ar 200 sccm O2 2 sccm H2O 5 sccm Pumping system: ULVAC U-8H Cryo pump ER400 Dry pump 2010 vintage.
ULVAC SIV-200S is a state-of-the-art sputtering equipment designed to deposit thin films of material onto substrates for a variety of applications. This system utilizes Radio Frequency (RF) sputtering in order to vaporize a target material and deposit the vaporized material onto a substrate in a uniform manner. On board SIV-200S are two planar magnetrons, each making up a half of the unit. The design of the machine allows for dual-target operation, making it possible to deposit two different materials on a substrate with a single run, thus reducing manufacturing time and cost. Additionally, the tool features an automatic degas chamber for cleaning the chamber which also maximizes deposition uniformity. The asset comes equipped with a high-capacity vacuum pump which can achieve a pressure of 1.3 x 10-3 Pa and operate in either continuous or batch processing mode. This is especially important for certain films as a low pressure substrate is required for producing high quality thin films. ULVAC SIV-200S features precise temperature control as well; both the chamber and substrate holder are individually controlled by two independent air-cooled temperature controllers which allows for the precise and uniform deposition of the proper temperature window to eliminate the creation of defects in the deposited film. High quality thin films can be deposited accurately and quickly with SIV-200S due to its uniform film thickness model which keeps the substrate and target at a constant gap regardless of the target material's thickness or distance from the substrate. This ensures uniform deposition across the entire substrate. Additionally, a fast PCR scan and film thickness monitor come standard on the equipment. ULVAC SIV-200S is a powerful and reliable sputtering system that can provide the precision and accuracy needed for thinner and more uniform thin films. With its powerful vacuum pump, dual magnetron unit, precise temperature control, uniform film thickness machine, and ability to deposit two different manufacturer in a single run, SIV-200S is a great choice for the deposition of a variety of thin films.
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