Used ULVAC SIV-500 #293608676 for sale

ULVAC SIV-500 is a high performance sputtering equipment used in the production of thin film material deposition and surface coatings. This system is used in a variety of applications in the semiconductor, chemical and mechanical manufacturing industries. SIV-500 is a vertical direct current (DC) magnetron sputtering unit that has been designed to provide precise and repeatable sample coating. It is equipped with a 5-target source which can sputter metal, oxides, and high-performance compound materials making it suitable for a wide range of applications. This machine also offers a large range of available sizes, from single substrate to multiple substrates with a wide variety of substrates materials including glass, polystyrene, and quartz. ULVAC SIV-500 comes with a variety of features which make it ideal for thin film production applications. It features an advanced closed-loop process controller which gives precise control over all aspects of the deposition process. This tool also has an integrated power supply allowing for precise control of the sputtering ionization process. SIV-500 has a four-stage evacuation asset providing rapid and consistent base pressure while maintaining at desired working pressure. It is also equipped with an advanced plasma sensor which allows for precise detection of the pressure and plasma state. This sensor serves to maintain a consistent gas environment for optimal sputtering performance. ULVAC SIV-500 offers a wide variety of sample exchange capabilities including a programmable sample exchange mechanism and an automated sample loading model. This equipment also allows for batch processing with its automatic sputtering depth control. Also, SIV-500's ion monitoring system allows for precise control of the film layer thickness. Overall, ULVAC SIV-500 is a high performance sputtering unit suitable for a wide range of applications, providing precise control and reliable film layer deposition. It offers a variety of features and capabilities allowing for efficient production of thin films.