Used ULVAC SIV-500 #293773983 for sale

ULVAC SIV-500 is a state-of-the-art sputtering equipment designed for advanced thin film deposition processes in the semiconductor, optics, and research industries. As a leading manufacturer of vacuum equipment, ULVAC has engineered SIV-500 to meet the high demands of modern material science research and production applications. This versatile system offers exceptional performance and flexibility for sputtering various materials onto substrates with precision and control. The key feature of ULVAC SIV-500 is its advanced magnetron sputtering technology, which enables efficient and uniform deposition of thin films on a wide range of substrate materials. The unit is equipped with multiple sputter cathodes, each capable of sputtering different target materials simultaneously, allowing for complex multilayer deposition processes. The cathodes are strategically positioned within the chamber to ensure optimal coverage and uniformity across large-area substrates. SIV-500 is equipped with a high-performance vacuum machine, featuring a reliable turbomolecular pump and rotary vane pump combination that provides fast pump-down times and high pumping speed for achieving ultra-high vacuum conditions. This ensures a clean and stable process environment with low levels of impurities, enabling high-quality film deposition with excellent adhesion and uniformity. In addition to its robust vacuum tool, ULVAC SIV-500 incorporates advanced process control features that allow users to precisely tune deposition parameters such as power, pressure, and gas flow rates in real-time. The asset is equipped with a user-friendly interface that provides intuitive control of all model functions, including recipe management, data logging, and remote monitoring capabilities. The deposition chamber of SIV-500 is designed for easy access and maintenance, with a hinged front door and quick-release clamps for convenient target and substrate loading. The chamber is made of high-quality stainless steel with excellent thermal insulation properties to ensure stable process temperatures and minimize heat loss during deposition. To enhance process flexibility, ULVAC SIV-500 can be equipped with various optional features such as substrate heating, in-situ thickness monitoring, and reactive sputtering capabilities. These additional functionalities allow users to tailor the equipment to meet specific process requirements and explore a wide range of thin film deposition techniques. Overall, SIV-500 is a reliable and versatile sputtering system that offers exceptional performance, precision, and control for a variety of thin film deposition applications. Whether used for research, development, or production, this unit delivers superior results with high repeatability and process stability, making it an ideal choice for cutting-edge material science research and advanced thin film manufacturing processes.